Specialty Gases 2021-12-14 537
Refrigerant:
Tetrafluoromethane is sometimes used as a low temperature refrigerant. Etching:
It is used in electronics microfabrication alone or in combination with oxygen as a plasma etchant for silicon, silicon dioxide, and silicon nitride.
Carbon Tetrafluoride CF4
CAS No.: 75-73-0
EINECS No.: 200-896-5
UN No.: UN1982
Purity: 99.999%
Dot Class: 2.2
Appearance: Colorless
Grade Standard: Industrial Grade, Refrigerant Grade
Specification | 99.999% |
Oxygen+Argon | ≤1ppm |
Nitrogen | ≤4 ppm |
Moisture(H2O) | ≤3 ppm |
HF | ≤0.1 ppm |
CO | ≤0.1 ppm |
CO2 | ≤1 ppm |
SF6 | ≤1 ppm |
Halocarbynes | ≤1 ppm |
Total Impurities | ≤10 ppm |